The global extreme ultraviolet lithography (EUVL) systems market revenue was around US$ 10 billion in 2022 and is estimated to reach US$ 75 billion by 2031, growing at a compound annual growth rate (CAGR) of 25.1% during the forecast period from 2023 to 2031.
Extreme ultraviolet lithography (EUVL) is one of the leading next-generation lithography (NGL) technologies utilized to print lines as little as 30nm and develop microchips and microprocessors. This technology may substitute optical lithography, which is utilized to device present-day microcircuits. The EUVL system operates by burning strong beams of ultraviolet light that are reflected from a circuit design pattern into a silicon wafer.
Market Driving Factors
Increasing adoption of miniaturization and sophistication of electronic circuit devices are estimated to boost the market growth. This is mainly due to the miniaturization of transistors and electronic circuits within microprocessors increases the power and density of these systems.
Manufacturers facilitating the process to increase efficiency is estimated to drive the market growth. This is primarily owing to the artificial intelligence contributes significantly to threat assessment by enabling businesses. In addition, it reduces the threat brought on by changes in the logistics. As a result, the final component of a perfect semiconductor supply chain method is the continuous real-time scanning for faults made possible by artificial intelligence and predictive systems.
The impact of 5G technology is estimated to create opportunities in the market. This is primarily due to the extreme-ultraviolet lithography technology is expected to continue to be in demand in the future owing to the continued emergence of possibilities for semiconductors such as the Internet of Things (IoT), 5G, and autonomous driving. As a result, semiconductor manufacturing firms will likely concentrate on incorporating cutting-edge manufacturing technologies.
Complexness in developing proper photoresists and challenges in making the ideal mask are some of the main elements that hinder market growth.
Regional Analysis
North America dominated the market in terms of the largest shares. This can be attributed to the continued technological advances. In addition, the demand for microchips surged along with the need for 5G connectivity, artificial intelligence (AI), augmented reality, and numerous other systems. This creates substantial possibilities for players in the market.
Asia Pacific is estimated to dominate the market in terms of revenue. This is due to the existence of a large number of semiconductor key players in the region and due to the high use of semiconductor devices like memories in the country. Furthermore, the immediate explanation of the semiconductor industry is estimated to boost the extreme ultraviolet lithography (EUVL) systems market in the region.
Segmentation Insights
Light Source Insight
The laser-produced plasmas (LPP) segment dominated the market in terms of shares and is estimated to maintain its dominance. This can be majorly attributed to the increased utilization of driving systems for laser-produced plasma, which efficiently transform the 1064-nm laser output to intense ultraviolet (EUV) light at 13.5 nm for microlithography systems.
Equipment Insight
The light source segment dominates the market in terms of the largest shares. This is owing to the atomic spectroscopy researchers around the world are trying to develop and utilize even smaller wavelength light sources for future lithography.
The mirrors segment dominated the market in terms of revenue and is estimated to continue its dominance. This can be attributed to the increased number of manufacturers who integrated a new optical system that utilized multilayer mirrors that are ultra-smooth in a vacuum chamber.
Prominent Companies
Segmentation Outline
The global extreme ultraviolet lithography (euvl) systems market segmentation focuses on the Light Source, Equipment, and Region.
By Light Source
By Equipment
By Region
[TABLE OF CONTENTS]
1 INTRODUCTION OF GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET
1.1 OVERVIEW OF THE MARKET
1.2 SCOPE OF REPORT
1.3 ASSUMPTIONS
2 EXECUTIVE SUMMARY: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET
3 RESEARCH METHODOLOGY
3.1 DATA MINING
3.2 VALIDATION
3.3 PRIMARY INTERVIEWS
3.4 LIST OF DATA SOURCES
3.5 ANALYST TOOLS AND MODELS
4 GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET OUTLOOK
4.1 OVERVIEW
4.2 MARKET DYNAMICS AND TRENDS
4.2.1 DRIVERS
4.2.2 RESTRAINTS
4.2.3 OPPORTUNITIES
4.3 PORTERS FIVE FORCE ANALYSIS
4.4 VALUE CHAIN ANALYSIS
4.5 MARKET GROWTH AND OUTLOOK
4.5.1 PRICE TREND ANALYSIS
4.5.2 OPPORTUNITY SHARE
5 GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY LIGHT SOURCE
5.1 OVERVIEW
5.2 LASER PRODUCED PLASMAS (LPP)
5.3 VACUUM SPARKS
5.4 GAS DISCHARGES
6 GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY EQUIPMENT
6.1 OVERVIEW
6.2 MASK
6.3 LIGHT SOURCE
6.4 MIRRORS
6.5 OTHERS
7 GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY GEOGRAPHY
7.1 OVERVIEW
7.2 NORTH AMERICA
7.2.1 NORTH AMERICA MARKET SNAPSHOT
7.2.2 U.S.
7.2.3 CANADA
7.2.4 MEXICO
7.3 EUROPE
7.3.1 EUROPE MARKET SNAPSHOT
7.3.2 WESTERN EUROPE
7.3.2.1 THE UK
7.3.2.2 GERMANY
7.3.2.3 FRANCE
7.3.2.4 ITALY
7.3.2.5 SPAIN
7.3.2.6 REST OF WESTERN EUROPE
7.3.3 EASTERN EUROPE
7.3.3.1 POLAND
7.3.3.2 RUSSIA
7.3.3.3 REST OF EASTERN EUROPE
7.4 ASIA PACIFIC
7.4.1 ASIA PACIFIC MARKET SNAPSHOT
7.4.2 CHINA
7.4.3 JAPAN
7.4.4 INDIA
7.4.5 AUSTRALIA & NEW ZEALAND
7.4.6 ASEAN
7.4.7 REST OF ASIA PACIFIC
7.5 MIDDLE EAST & AFRICA
7.5.1 MIDDLE EAST & AFRICA MARKET SNAPSHOT
7.5.2 UAE
7.5.3 SAUDI ARABIA
7.5.4 SOUTH AFRICA
7.5.5 REST OF MEA
7.6 SOUTH AMERICA
7.6.1 SOUTH AMERICA MARKET SNAPSHOT
7.6.2 BRAZIL
7.6.3 ARGENTINA
7.6.4 REST OF SOUTH AMERICA
8 GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET COMPETITIVE LANDSCAPE
8.1 OVERVIEW
8.2 COMPANY MARKET RANKING
8.3 KEY DEVELOPMENT STRATEGIES
8.4 COMPETITIVE DASHBOARD
8.5 PRODUCT MAPPING
8.6 TOP PLAYER POSITIONING, 2022
8.7 COMPETITIVE HEATMAP
8.8 TOP WINNING STRATEGIES
9 COMPANY PROFILES
9.1 CANON INC
9.1.1 OVERVIEW
9.1.2 FINANCIAL PERFORMANCE
9.1.3 PRODUCT OUTLOOK
9.1.4 KEY DEVELOPMENTS
9.1.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.2 NIKON CORPORATION
9.2.1 OVERVIEW
9.2.2 FINANCIAL PERFORMANCE
9.2.3 PRODUCT OUTLOOK
9.2.4 KEY DEVELOPMENTS
9.2.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.3 ASML
9.3.1 OVERVIEW
9.3.2 FINANCIAL PERFORMANCE
9.3.3 PRODUCT OUTLOOK
9.3.4 KEY DEVELOPMENTS
9.3.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.4 ULTRATECH INC.
9.4.1 OVERVIEW
9.4.2 FINANCIAL PERFORMANCE
9.4.3 PRODUCT OUTLOOK
9.4.4 KEY DEVELOPMENTS
9.4.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.5 VISTEC SEMICONDUCTOR SYSTEMS
9.5.1 OVERVIEW
9.5.2 FINANCIAL PERFORMANCE
9.5.3 PRODUCT OUTLOOK
9.5.4 KEY DEVELOPMENTS
9.5.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.6 INTEL CORPORATION
9.6.1 OVERVIEW
9.6.2 FINANCIAL PERFORMANCE
9.6.3 PRODUCT OUTLOOK
9.6.4 KEY DEVELOPMENTS
9.6.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.7 NUFLARE TECHNOLOGY INC.
9.7.1 OVERVIEW
9.7.2 FINANCIAL PERFORMANCE
9.7.3 PRODUCT OUTLOOK
9.7.4 KEY DEVELOPMENTS
9.7.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
9.8 SAMSUNG CORPORATION
9.8.1 OVERVIEW
9.8.2 FINANCIAL PERFORMANCE
9.8.3 PRODUCT OUTLOOK
9.8.4 KEY DEVELOPMENTS
9.8.5 KEY STRATEGIC MOVES AND DEVELOPMENTS
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